{ "url": "https://fahrplan.events.ccc.de/rc3/2020/Fahrplan/events/11364.html", "id": 11364, "guid": "8f3ef0f5-4929-48b1-87b7-781245aae7ac", "logo": "/system/events/logos/000/011/364/large/n00dl0r.jpg?1605117415", "date": "2020-12-30T14:00:00+01:00", "start": "14:00", "duration": "00:40", "room": "rC2", "slug": "rc3-11364-i_could_not_resist", "title": "I could not resist", "subtitle": "Resists for Electron Beam Lithography (EBL)", "track": "Hardware & Making", "type": "Talk", "language": "en", "abstract": "Photoresists are one of the essential ingredients for chip manufacturing and micro/nano engineering.\r\nWe will show how we\u2019re using them in a DIY Electron Beam Lithography set-up and how you\u2019re able to cook your own cheap resists and mix your own developers.", "description": "\r\n\r\n\r\n

Resists? What's that?

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EBL? What's that?

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DIY cooking of PMMA based resists

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Composition of different developers

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Applications

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The EBL exposure process

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Stuff comes together

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More Examples

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Thanks & Credits

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Q & A

\r\n\r\n\r\n\r\n", "recording_license": "", "do_not_record": false, "persons": [ { "id": 12148, "public_name": "N00DL3" } ], "links": [], "attachments": [], "room_id": "32b5ad05-ab7d-44eb-a6e6-7ca616eed34a", "origin": null }